光刻机步进扫描运动轨迹重叠规划算法  

Algorithm of Trajectory Overlay Planning for Step-and Scan-move in Scanner Lithography

作　　者：穆海华[1,2] 周云飞[1] 周艳红[2] 

机构地区：[1]华中科技大学数字装备与技术国家重点实验室,武汉430074 [2]华中科技大学计算机科学与技术学院,武汉430074

出　　处：《机械工程学报》2010年第7期122-127,共6页Journal of Mechanical Engineering

基　　金：国家自然科学基金(50775088);中国博士后科学基金(20080430971)资助项目

摘　　要：研究一种步进扫描投影光刻机的步进运动与扫描运动的轨迹重叠规划算法。根据给定的系统动力学约束,以保证最大加速度与最大速度不超限为目标,建立步进运动与扫描运动轨迹重叠规划的约束基准。依据该基准,分析步进运动与扫描运动轨迹重叠规划的各种可能情形,推导在最大程度上缩短运动执行时间的轨迹拐点调整计算公式。以此为基础,提出步进运动与扫描运动的轨迹重叠规划算法。通过仿真计算验证算法的正确性与有效性。实际应用证明该算法能在保证运动精度基础上,极大地提高生产率。该算法已被100 nm步进扫描投影光刻机工作台超精密运动控制系统所采用。An algorithm of trajectory overlay planning is investigated for step-move and scan-move of step-scan lithography. Based on system dynamic constraints, several criteria of trajectory overlay planning are constructed to ensure motion parameters planned within its preset values respectively. All available instances of trajectory overlay planning are discussed, and relevant equations are further derived. As a result, the algorithm of trajectory overlay planning for step-move and scan-move is presented. The correctness and effectiveness of the algorithm are demonstrated by simulation calculation and practical results. High productivity and high motion accuracy are obtained by applying the presented method. This algorithm has been applied in the motion control system of 100 nm step-scan lithography successfully.

关 键 词：步进扫描运动 约束基准 轨迹规划 重叠 

分 类 号：TP391[自动化与计算机技术—计算机应用技术]