低温等离子体技术处理全氟化合物研究进展  

Research Progress in Decomposition of Perfluorochemicals by Non-thermal Plasma Technology

作　　者：李振玉[1] 孙亚兵[1] 徐建华[1] 陈颖[1] 缪虹[1] 王瑾瑜[1] 王惠英[1] 

机构地区：[1]南京大学环境学院污染控制与资源化国家重点实验室,江苏南京210093

出　　处：《环境科技》2010年第2期59-63,共5页Environmental Science and Technology

基　　金：水处理与水环境修复教育部工程研究中心开放基金资助项目(WTWER0709)

摘　　要：对低温等离子体技术降解全氟化合物的研究现状、新型技术、成果、存在的问题以及发展方向做了全面综述。着重总结了微波等离子体技术、水等离子体技术、填充床等离子体技术等。简要阐明了低温等离子体技术对全氟化合物的去除机理,以及微波等离子体技术和水等离子体技术对CF4的降解机理。最后总结低温等离子体技术对全氟化合物降解的发展前景。Present status, new technologies, achievements and development about decomposition of porfluorochemicals by non-thermal plasma were reviewed. Such technologies as microwave plasma, water plasma and packed-bed plasma were discussed. The mechanisms of perfuorochemicals were investigated, such as the mechanisms of CF4 decomposition by microwave plasma and water plasma. Finally, the prospects for perfluorochemicals by plasma were concluded.

关 键 词：全氟化合物 低温等离子体 机理 

分 类 号：X2[环境科学与工程—环境科学]