对向靶溅射高炮和磁化强度(Fe,Ti)-N薄膜  

(Fe,Ti)-N Thin Films with High Saturation Magnetization by Facing Targets Sputtering

作　　者：姜恩永[1] 王合英[1] 刘明升 

机构地区：[1]天津大学应用物理系,天津300072

出　　处：《真空科学与技术》1998年第2期146-150,共5页Vacuum Science and Technology

基　　金：国家自然科学基金;21世纪青年科学基金

摘　　要：本实验用对向靶溅射仪分别在Si（100），NaCl单晶衬底上成功地制备出具有高炮和磁化强度的（Fe，Ti）－N薄膜，研究了氮气分压和衬底温度对薄膜结构与磁性的影响。氮气分压为0．04～0．07Pa，衬底温度为100～150℃时，有利于Fe_(16)N_2相的形成，在此条件下制备的（Fe，Ti）－N薄膜的饱和磁化强度为2．3～2．46T，超过纯Fe的饱和磁化强度值。In this study,the (Fe,Ti)-N then films with high saturation magnetization were grown on Si(100) and NaCl single crystal substrates by facing targets sputtering. X-ray diffiactometer and transimission electron microscope were used to investigate the influence of nitrogen gas pressure and substrate temperature on the sturctures and magnetic proper-ties of (Fe,Ti)-N films.When p_N_2 = 0.04～0.07 Pa and T_8 = 100~150℃,it is advantageous to form Fe_(16)N_2 phase.The saturation magnetization of the(Fe, Ti)-N films deposited under these conditions was 2. 3 ~ 2.46 T, which is larger than that of pure iron.

关 键 词：对向靶溅射 薄膜 磁性 铁氮薄膜 

分 类 号：O484[理学—固体物理]