阳极线性离子源辅助磁控溅射沉积氮化钛薄膜的研究  

Research on TiN Films Deposited by Anode Linear Ion Source Assisted Magnetron Sputtering

作　　者：卢春灿[1] 聂朝胤[1] 潘婧[1] 贾晓芳[1] 谢红梅[1] 杨娟[1] 

机构地区：[1]西南大学材料科学与工程学院,重庆400715

出　　处：《材料导报》2010年第10期29-32,共4页Materials Reports

基　　金：重庆市科技攻关计划项目(CSTC2008AC4017;CSTC2009AB6127)

摘　　要：采用阳极线性离子源辅助磁控溅射技术,通过改变氮气流量以及离子源功率,在低温(150℃)条件下以不锈钢为基体制备了氮化钛薄膜。采用X射线衍射技术、显微硬度计、球盘式摩擦磨损仪、压痕法研究了薄膜的结构、硬度、耐磨性和结合强度,结果表明,采用阳极线性离子源辅助磁控溅射法在150℃低温条件下能制备出具有良好特性的金黄色的氮化钛薄膜。当氮气流量为20sccm、离子源功率为300W时,制备的薄膜硬度达到2039HV,且薄膜的耐磨性与结合强度最佳。离子的轰击作用使薄膜的力学性能得到了较大改善。TiN films deposited on stainless steel substrate are obtained using anode linear ion source assisted magnetron sputtering at a low temperature of 150℃ by changing the flow of N2 and the power of ion source. The microstructure, microhardness, wear-resistance and adhesion strength of TiN films are analyzed with XRD, microhardness test, the ball-disk wear test, indentation method, respectively. The results show that Golden TiN films can be deposited by anode linear ion source assisted magnetron sputtering at a low temperature of 150℃. The films with the best wear resistance and adhesion strength is obtained when the flow of N2 is 15scem and the power of ion source is 300W, and then rhe value of microhardness reaches 2039Hv. Mechanical properties of deposited films can be improved by ion bombardment.

关 键 词：阳极线性离子源 磁控溅射 低温 氮化钛 结合强度 

分 类 号：TB43[一般工业技术]