磁场非平衡状态对磁控管放电特性及Cr膜微观结构的影响  

The Influence of Unbalanced State of Magnetic Filed on Magnetron Discharge Characteristics and Mircostructure of Cr Coating

作　　者：文晓斌[1] 李显[1] 蒋百灵[1] 

机构地区：[1]西安理工大学材料科学与工程学院,陕西西安710048

出　　处：《西安理工大学学报》2010年第1期71-76,共6页Journal of Xi'an University of Technology

基　　金：国家"863"科技攻关基金资助项目(2005AA33H010)

摘　　要：通过采用不同磁场强度的磁铁获得了3种不同非平衡态的磁控管,采用单靶溅射模式于单晶硅衬底上制备了Cr膜。研究了不同磁场非平衡状态下磁控管的伏安特性,并对不同非平衡状态下溅射空间的磁场分布进行了模拟;采用扫描电镜和X射线衍射仪分别对所沉积Cr膜的微观组织和晶体结构进行了观察和分析。结果表明:随着磁场非平衡度的降低,靶表面磁场趋于内敛,磁场对等离子体的约束能力n值由6.05增至20.24。不同磁场非平衡状态下获得的Cr膜均为沿Cr(110)面择优生长的柱状晶结构,磁场非平衡度的增大有利于镀层颗粒的细化及表面质量的改善,但致密性变化趋势相反。Three different unbalanced state magnetrons were obtained by changing the magnet intensity of magnetron.The Cr coating were deposited on single Si substrate under single sputtering pattern.The voltage-ampere characteristic of magnetrons under different unbalanced states were studied and the magnetic filed distribution were simulated,stereoscan and X-ray diffraction device were used to observe and analyse the crystal and microstructure of Cr coating.The results showed that： with the reduce of unbalanced coefficients of magnetron,the magnetic filed of target surface tend to assemble,the n value of magnetic filed restrict ability increased from 6.05 to 20.24.The cross-section topography of Cr coating were all column crystal structure with Cr（110） preferential orientation under different unbalanced states.Although the increased unbalanced coefficient of magnetron was contributed to get fine grain and improve the surface quality,the density tendency of Cr coating was opposite.

关 键 词：磁控溅射 磁场非平衡度 Cr膜 伏安特性 微观组织 

分 类 号：TG144[一般工业技术—材料科学与工程] TB43[金属学及工艺—金属材料]