TiN类薄膜的激光化学气相沉积  

PREPARING FILMS OF TITANIUM CARBIDE AND NITRIDE ON TITANIUM ALLOY BY LCVD

作　　者：张鸿俭[1] 冯钟潮[2] 张鹤 

机构地区：[1]沈阳工业学院 [2]中科院金属研究所 [3]首都航天机械公司波纹管厂

出　　处：《兵器材料科学与工程》1999年第1期41-44,共4页Ordnance Material Science and Engineering

摘　　要：研究了激光化学气相沉积的方法在Ｔｉ和Ｔｉ－６Ａｌ－４Ｖ基材上沉积ＴｉＮ、ＴｉＣ、 Ｔｉ（Ｃｎ、Ｎｍ）薄膜的工艺方法，并获得了良好膜层的最佳工艺。在低压下用激光化学气相沉积 （ＬＣＶＤ）方法制备成功的ＴｉＮ类薄膜颜色金黄，成份均匀，其平均显微硬度为ＨＫ２５００，耐磨 性比基材提高了六倍。It is meaningful to produce films on Ti or Ti alloy in order to improve the properties of hard- ness, wear resistance, corrosion resistance, fatigue, etc. In this paper, the technologies to obtain TiN, TiC, Ti(CN) composite films on Ti and Ti - 6kl - 4V substrates have been studied. the optimizing process to ob- tain films has been found by laser - induced chemicai vapor deposition (LCVD) . The pure stoichicmetric TiN - like films were obtained by LCVD under low pressure which had homochromatic ingredients and golden col- or. The average microhardness of LCVD TiN films is HK2500 and the wear resistance is six times as much as that of substrates.

关 键 词：TiN类薄膜 钛合金 激光化学气相沉积 

分 类 号：O614.411[理学—无机化学] O484[理学—化学]