CVD涂层技术对硬质合金材料形成脱碳层(η相层)影响分析  

Influence of CVD Method on Decarburized Layer Formed on Cemented Carbide Substrate

作　　者：宋洪刚[1] 曾祥才[1] 高见[1] 袁晓光[1] 吴春涛[1] 

机构地区：[1]成都工具研究所

出　　处：《工具技术》2010年第5期21-23,共3页Tool Engineering

基　　金：国家科技支撑计划(2008BAF32B06)

摘　　要：采用CVD技术对硬质合金材料涂层时,温度超过1000℃很容易在基体材料表面形成脱碳层。先进行900℃以下的中温TiCN、TiN涂层作为保护层,再进行高温涂层,能有效降低脱碳层的厚度。本文分析了脱碳层对基体材料抗弯强度的影响,并对不同涂层刀片的切削性能进行了对比分析。When the coatings deposited onto the cemented carbide substrate by chemical vapor deposition method,it is quiet easy to form a decarburized layer on the surface of the substrate if the temperature is above 1000℃.In order to decrease the thickness of the decarburized layer,a TiCN or TiN coating is firstly deposited on the carbide materials as a buffer layer to protect the substrate below the temperature of 900℃,and then the other coatings are processed at a high temperature.The paper investigates the influence of decarburized layer on the bending strength of the substrate material,and comparative analyses the turning performance of the carbide tips covered by different coatings.

关 键 词：CVD 硬质合金 脱碳层 抗弯强度 

分 类 号：TG113.12[金属学及工艺—物理冶金] TG17[金属学及工艺—金属学]