直流反应磁控溅射CrN_X功能装饰涂层的研究  

Study of Magnetron Reactive Sputtering CrNX Decoration Films with Functional Protection

作　　者：张栋[1] 孙丽丽[1] 郑贺[1] 汪爱英[1] 

机构地区：[1]中国科学院宁波材料技术与工程研究所,浙江宁波215201

出　　处：《中国表面工程》2010年第3期38-41,共4页China Surface Engineering

基　　金：浙江省科技攻关项目(2008C21055);浙江省重大科技专项(2009C11SA550048)

摘　　要：采用反应磁控溅射制备不同氮气流量下的CrNX膜,观察薄膜颜色的变化,采用球盘式摩擦磨损仪、台阶仪、金相显微镜测试薄膜的耐磨性能,并采用X射线衍射技术、场发射扫描电镜观测薄膜的相成份以及微观形貌。研究结果表明,随着氮气含量的增加,薄膜颜色由银灰色逐渐过渡为深灰色,薄膜相结构由单相Cr2N转变为Cr2N和CrN混合相继而转变为单相CrN,当氮气流量为20cm3·min-1以及30cm3·min-1时薄膜表现出良好的耐磨性。采用高氮气流量的工艺镀中间层,低氮气流量的工艺镀表面层,复合薄膜的耐磨性大幅度提高,同时能够获得美观的银灰色外观。CrNX films were deposited by direct current reactive magnetron sputtering at various nitrogen flow rates.Color of the films was investigated,the tribological properties,phase composition and surface morphology of the CrNX films were investigated by pin on disk system,step-height tester,metallurgical microscope,XRD,and SEM.The results showed that,as the increase of nitrogen flow rates,the film color changed from silver gray to dark gray,phase composition transformation from Cr2N to mixture of Cr2N and CrN then to CrN single-phase.The CrNx films deposited at the N2 flux of 20 cm3·min-1 and 30 cm3·min-1 exhibit good wear resistance.Multilayered films which exhibit good wear resistance and had silver gray color for decoration were composed of a low nitrogen flux buffer layer and a high nitrogen flux surface layer.

关 键 词：反应磁控溅射 CrNX 耐磨性 

分 类 号：TG174.44[金属学及工艺—金属表面处理] TB43[金属学及工艺—金属学]