激光预处理对SiO_2单层膜中缺陷的影响  

Influence of Laser-Conditioning on Defects of SiO_2 Mono-Layer Films

作　　者：李笑[1,2] 刘晓凤[1,2] 赵元安[1] 邵建达[1] 

机构地区：[1]中国科学院上海光学精密机械研究所强激光材料重点实验室,上海201800 [2]中国科学院研究生院,北京100049

出　　处：《中国激光》2010年第6期1626-1630,共5页Chinese Journal of Lasers

基　　金：国家863计划(2006AA804908)资助课题

摘　　要：采用小光斑激光预处理扫描SiO2单层膜,利用激光损伤阈值的光斑效应对预处理前后SiO2单层膜中缺陷的影响进行分析,并引入缺陷阈值和缺陷密度来表征薄膜中引起损伤的缺陷。研究表明,激光预处理可以使SiO2单层膜在采用最大光斑条件下的损伤阈值提高1.6倍左右,并且激光预处理可清除薄膜中低阈值的缺陷。The influence of laser-conditioning on defects of SiO2 mono-layer films,which is laser conditioned by small spot laser scanning process,is investigated by the spot-size effect of laser-induced damage.The threshold and the density of defect were introduced to characterize the initiating defects in the film.It is found that the laser-induced damage threshold can be increased by a factor of 1.6 under the largest spot-size used and the defects with low threshold can be removed by laser conditioning scanning process.

关 键 词：薄膜 激光预处理 SiO2单层膜 光斑效应 缺陷 

分 类 号：TN249[电子电信—物理电子学] O484[理学—固体物理]