羟基磷灰石义眼台植入后暴露原因分析及处理  

Analysis on causes and management of exposed orbital hydroxyapatite implants

作　　者：林伟[1] 樊映川[1] 罗又蓉[1] 

机构地区：[1]四川省人民医院眼科,四川成都610072

出　　处：《眼外伤职业眼病杂志》2010年第6期453-455,共3页Journal of Injuries and Occupational Diseases of the Eye with Ophthalmic Surgeries

摘　　要：目的探讨羟基磷灰石义眼台植入术后暴露原因及处理。方法对15例羟基磷灰石义眼台植入后义眼台暴露者,寻找分析其暴露原因,并根据义眼台暴露情况不同采用相适宜的治疗方法。结果经保守或手术治疗后,随访6月-3年,12例效果良好,治愈率为80%。结论羟基磷灰石义眼台植入术中应积极避免暴露因素,对于义眼台暴露者,根据暴露直径及原因等,采用相适宜的不同处理。Objective To explore the causes and managements of the exposure of orbital hydroxyapatite implants. Methods Analysis on the causes and the managements of 15 cases with hydroxyapatite implant exposure. Results 15 cases were managed conservatively or by operation and 12 cases were performed after managements with the 6 months to 3 years follow-up. Conclusion It should be to avoid the exposure factor in the operation,Different methods may be applied to manage hydroxyapatite implant exposure according to the sizes and the causes of exposure.

关 键 词：羟基磷灰石义眼台 暴露 原因 处理 

分 类 号：R779.64[医药卫生—眼科]