Al含量对TiAlSiN薄膜常温及高温微观形貌的影响  

Effects of Al Content on Surface Morphology of TiAlSiN Films at Different Temperatures

作　　者：王昕[1] 徐建华 马胜利[1] 徐可为[1] 

机构地区：[1]西安交通大学金属材料强度国家重点实验室,西安710049

出　　处：《煤矿机械》2010年第7期54-56,共3页Coal Mine Machinery

摘　　要：采用弧离子增强磁控溅射(AEMS)方法制备了TiAlSiN多元硬质薄膜,研究了不同Al含量对薄膜常温及高温微观形貌的影响。结果表明,此类薄膜均具有致密的显微组织,对应于特定Al含量,薄膜表面形貌最优,缺陷最少;薄膜高温热稳定性和抗氧化能力优异,800℃未观察到明显的表面显微组织变化。Arc Enhanced Magnetron Sputtering（AEMS）was used to deposit multi-component hard films TiAlSiN on steel and wafer. The effect of different Al content on surface morphology of the films at different temperatures, as room temperature and 800-1 200 ℃, was investigated. The results indicated that the films deposited by AEMS had a dense, non-columnar structure and the finest microstructure was corresponding to some specific Al content. Thermal stability and oxidation resistance of the films were excellent and no decomposition was observed even at 800 ℃.

关 键 词：硬质薄膜 磁控溅射 表面形貌 

分 类 号：TG151[金属学及工艺—热处理]