光学加工中抛光垫特征对工件面形的影响分析  

The Effect of Characteristic of Pad on Surface Form of Optical Flats in Polishing

作　　者：谢瑞清[1] 李亚国[1] 王健[1] 陈贤华[1] 黄浩[1] 许乔[1] 

机构地区：[1]成都精密光学工程研究中心,成都610041

出　　处：《光电工程》2010年第7期64-69,共6页Opto-Electronic Engineering

基　　金：国家高技术发展计划项目

摘　　要：抛光是光学加工中获得超精密表面的主要手段。为明确抛光垫特征对平面光学元件抛光面形的影响规律,分析了抛光垫与工件之间的界面接触形式,并建立接触力学分析模型,运用有限元方法分析了工件与抛光垫之间的接触压力分布情况,获得了抛光垫厚度及表面球半径等特征对抛光压力分布的影响规律。基于理论分析结果,提出了一种新的平面抛光面形控制技术。在实验中对一块尺寸为430mm×430mm×60mm的熔石英元件进行了加工,通过将抛光垫表面修整为微凸面,同时对抛光转速比进行精确控制,实现了工件面形精度的快速收敛。Polishing is a primary means to get ultra-precision surface in optical manufacturing.In order to obtain the effect of characteristic of pad on surface form of optical flats in polishing,the contacting types between pad and workpiece were analyzed and a model was set up.Then the contacting pressure distribution on the interface between workpiece and polishing pad was calculated by using finite element method.Furthermore,the effect of pad thickness and sphere radius on pressure distribution was investigated.Based on results of theoretical analysis,a new polishing technique for correcting surface form of optical flats is presented.A 430 mm×430 mm×60 mm size fused silica workpiece has been polished in the experiment.By conditioning pad surface to convex form and accurately controlling polishing speed ratio,the form accuracy of workpiece has been improved fast.

关 键 词：光学加工 抛光 工件面形 压力分布 抛光垫 

分 类 号：TQ171.734[化学工程—玻璃工业]