莫尔条纹分析及其在光刻对准中的应用  

The Analysis of Moiré Fringes and Application on the Alignment of Lithography

作　　者：马平[1] 周绍林[1] 胡松[1] 徐文祥[1] 

机构地区：[1]中国科学院光电技术研究所,成都610209

出　　处：《光电工程》2010年第7期102-106,共5页Opto-Electronic Engineering

基　　金：国家自然科学基金项目(60706005)

摘　　要：从莫尔条纹用于光刻对准的实际应用出发,从傅里叶光学的角度重点讨论了一般光栅及线光栅对莫尔条纹的调制规律,并对广泛应用的低频(1,-1)级莫尔条纹进行了仿真分析。最后通过仿真分析说明,在光刻对准中,对栅线重复频率相差很小的两光栅对准标记,将产生对位移具有高灵敏度特性的放大莫尔条纹,从而实现高精度光刻对准,并对采用该对准方法的光刻对准精度进行了简要分析。Based on the actual application of Moiré fringes for the alignment of lithography,the modulating regulation on Moiré fringes produced by generic and line gratings is discussed according to Fourier optics in this paper,and the low frequency（1,-1） class Moiré fringe which is extensively applied was simulated.Aimed at two grating marks of the little difference from repeated frequency for the alignment of lithography,the magnified Moiré fringes would be produced with the characteristic sensitive to displacement,which was explained by simulation.Thus,high alignment accuracy of lithography was achieved.Finally,the alignment accuracy of lithography by the alignment method was analyzed briefly.

关 键 词：莫尔条纹 光栅 调制规律 光刻对准 

分 类 号：TN305.7[电子电信—物理电子学]