Pd/V_2O_5薄膜的氢气敏感性质研究  

Research on Hydrogen Sensing Properties of Pd/V_2O_5 Thin Films

作　　者：余海湖[1] 史勇[2] 吴银伟[2] 黄金山[2] 

机构地区：[1]武汉理工大学材料复合新技术国家重点实验室,武汉430070 [2]武汉理工大学光纤传感技术与信息处理教育部重点实验室,武汉430070

出　　处：《武汉理工大学学报》2010年第11期6-8,13,共4页Journal of Wuhan University of Technology

基　　金：国家自然科学基金重点项目(60537050)

摘　　要：采用磁控溅射法制备了不同厚度的Pd/V2O5双层复合薄膜,采用紫外-可见光分光光度计研究了薄膜的氢气敏感性质,原位测量了薄膜的激光拉曼光谱并分析了薄膜的氢气敏感机理。结果表明,复合薄膜V2O5(280 nm)/Pd(30nm)对氢气的敏感性质较好,对0.01%H2-N2有响应,在4%H2-N2标气中,在560 nm处透过率的相对变化值达到25%。拉曼光谱分析结果表明,Pd/V2O5薄膜在与氢气作用过程中,Pd膜主要起催化作用,氢原子扩散到V2O5层,V5+转变为V4+,导致Pd/V2O5薄膜的透过率发生变化。Pd/V2O5 double-layer films with different thickness were deposited with magnetron sputtering method.The hydrogen-sensing properties and the gasochromic mechanism of the composite films were investigated with a UV-Vis spectrophotometer and a Raman spectroscope,respectively.The results show that,thin film V2O5（280 nm）/Pd（30 nm） possesses relatively good sensing properties to hydrogen gas.This thin film is sensitive to 0.01% H2-N2,and a change of 25% in relative transmitance at 560 nm can be observed in 4% H2-N2.The Raman spectra suggest that Pd thin film mainly palys a role of catalyzer.The insertion of hydrogen atoms into the interlayers of V2O5 causes the transformation of V5＋ to V4＋,and as a result,causes the changes in transmitance of the films.

关 键 词：Pd/V2O5薄膜 磁控溅射 氢敏性质 气致变色机理 

分 类 号：O484.4[理学—固体物理]