TiN/AlN 纳米多层膜的制备及力学性能  

Preparation and Mechanical Properties of TiN/AlN Nano Multilayers

作　　者：李戈扬[1,2] 施晓蓉[1,2] 张流强 吴亮[1,2] 李鹏兴[1,2] 

机构地区：[1]上海交通大学金属基复合材料国家重点实验室 [2]中国科学院上海冶金研究所

出　　处：《上海交通大学学报》1999年第2期159-161,共3页Journal of Shanghai Jiaotong University

摘　　要：采用多靶反应磁控溅射法制备了ＴｉＮ／ＡｌＮ纳米多层膜，并通过ＸＲＤ、ＴＥＭ和显微硬度计对多层膜的调制结构和力学性能进行了研究．结果表明，反应磁控溅射法制得的纳米多层膜调制界面平直清晰；薄膜的硬度随其调制周期Λ的减小而单调增加，硬度在Λ＝２ｎｍ时达到最大值ＨＫ３２．９３ＧＰａ．TiN/AlN nano multilayers were fabricated using multi target reactive sputtering method. The microstructure and hardness of nano multilayers were detected by XRD, TEM and microindentor respectively. The results show that the modulated interface of nano multilayers prepared in this way is smooth and clear; the hardness of TiN/AlN nano multilayers increases with the decrease of wavelength Λ and the maximum hardness reaches HK32.93 GPa at Λ =2 nm.

关 键 词：纳米多层薄膜 力学性能 氮化钛 氮化铝 制备 

分 类 号：O484.1[理学—固体物理] O484.4[理学—物理]