精确分析电磁聚焦系统结构参数微小变化对粒子轨迹的影响  

Accurate Calculation of Influence of Electrode Perturbation in Electromagnetic Focusing System on Particle Trajectory

作　　者：雷威[1] 

机构地区：[1]东南大学电子工程系,南京210096

出　　处：《电子学报》1999年第3期140-141,139,共3页Acta Electronica Sinica

摘　　要：本文提出一种新的方法分析带电粒子光学系统中电极扰动对粒子轨迹的影响首先计算电位对扰动变量的导数，然后计算粒子轨迹等参量对扰动变量的导数，最后得到电极扰动对系统性能的影响与以前的一些计算方法相比较。This paper proposes a new way to calculate the influence of electrode perturbation on particle trajectory. In terms of variational principle, the derivative of potential versus electrode displacement is computed first. Then the derivative of practical trajectory is calculated and the influence of electrode perturbation on trajectory is obtained. Compared with old method, this algorithm can improve the computational accuracy and efficiency.

关 键 词：电极扰动 带电粒子光学 粒子轨迹 电磁聚焦系统 

分 类 号：O441.4[理学—电磁学] TN201[理学—物理]