刻线边缘表面重构及其边缘粗糙度测量  

Recognition of the single-side surface and measurmement of line edge roughness

作　　者：李洪波[1,2] 赵学增[2] 褚巍[2] 

机构地区：[1]北京理工大学光电学院,北京100081 [2]哈尔滨工业大学机电工程学院,黑龙江哈尔滨150001

出　　处：《光电子．激光》2009年第12期1635-1640,共6页Journal of Optoelectronics·Laser

摘　　要：给出了一种边缘粗糙度(LER)三维参数评估的方法。采用原子力显微镜(AFM)测量了刻线单侧边缘形貌,根据AFM的工作机理和测量特点重构边缘表面,采用回归分析方法确定了边缘表面的评价基准面。结合集成电路中光刻工艺的具体需求,提出了能够反映边缘表面形貌特征的三维LER表征参数。结合实例,计算了所提出的部分LER参数,分析了LER标准差参数的测量精度。A novel method by using 3D parameters is presented to measure line edge roughness（LER）.Single-side surface profiles （sidewall） are acquired using atomic force microscope（AFM）.The single-side surface is reconstructed according to AFM working mechanism and measurement characters,and the reference plane is defined by regression theory.In line with integrated circuit development,as well as practical requirements in the semiconductor and lithography industry,a group of 3D-LER parameters are proposed to describe single-side surface profile.LER parameters are calculated via one measured sample,and the measurement precision of the standard error,one of LER parameters,is also given out.

关 键 词：原子力显微镜(AFM) 重构 边缘粗糙度(LER) 三维参数 

分 类 号：TG84[金属学及工艺—公差测量技术] TH161[机械工程—机械制造及自动化]