ZnO压电薄膜双面共溅生长技术  

Technique for Fabricating ZnO Piezoelectric Thin Films on the Two Ends of the YAG Rod Simultaneously by DC Reactive Magnetron Sputtering

作　　者：郑泽渔[1] 汤劲松[1] 朱昌安[1] 周勇[1] 王宗富[1] 

机构地区：[1]四川压电与声光技术研究所,重庆400060

出　　处：《压电与声光》2010年第4期629-630,633,共3页Piezoelectrics & Acoustooptics

摘　　要：在只有一个靶源的情况下,利用改良的夹具,在钇铝石榴石(YAG)晶体的两端用反应磁控溅射法同时溅射生长ZnO压电薄膜。对ZnO压电薄膜做了X-射线衍射(XRD)分析,测试了用双面方法制作的声体波薄膜换能器的回波损耗。结果表明,采用双面共溅工艺生长ZnO压电薄膜有效地解决了第一端换能器压电性能退化的问题,提高了两端换能器压电性能的一致性,提高了生产效率。ZnO piezoelectric thin films were deposited on the two ends of the YAG rod simultaneously using the special clamps by DC reactive magnetron sputtering with one target.XRD analysis was done on ZnO thin films and the return loss of bulk acoustic wave transducer made by above method was tested.The results indicated that the degradation problem of the piezoelectric properties of the first transducer was solved by this method.The conversion efficiencies of the input and output transducers were similar,and the production efficiency was raised.

关 键 词：氧化锌 压电薄膜 溅射 声体波 

分 类 号：TN65[电子电信—电路与系统]