Si含量对Ti-Al-Si-N薄膜微结构与力学性能的影响  

Influence of Si content on microstructure and mechanical property of Ti-Al-Si-N films

作　　者：喻利花[1] 薛安俊[1] 董松涛[1] 许俊华[1] 

机构地区：[1]江苏科技大学材料科学与工程学院,江苏省先进焊接技术重点实验室,江苏镇江212003

出　　处：《材料热处理学报》2010年第7期140-145,共6页Transactions of Materials and Heat Treatment

基　　金：国家自然科学基金(50574044);江苏省自然科学基金(BK2008240)

摘　　要：采用多靶反应磁控溅射技术制备了一系列不同Si含量的Ti-Al-Si-N复合膜。采用能谱仪、X射线衍射仪、三维轮廓仪、原子力显微镜和显微硬度仪对薄膜进行表征,研究了Si含量对Ti-Al-Si-N复合膜微结构和力学性能的影响。结果表明:用Ti0.33 Al0.67合金靶制备的Ti-Al-N复合膜呈双相共存结构(fcc+hcp),Si的加入,促进了六方相的生长,细化了晶粒,降低了表面粗糙度。随着Si含量的增加,Ti-Al-Si-N复合膜的硬度逐渐增大,在Si含量为16.69 at%时,达到最大硬度32.3 GPa,继续增加Si含量,薄膜硬度降低。A series of Ti-Al-Si-N composite films with different Si contents were fabricated by reactive magnetron sputtering technique.The films were investigated by energy dispersive spectroscopy,X-ray diffraction,3D profilometer,atomic force microscopy and microhardness tester.The effects of Si contents on microstructure and mechanical property of Ti-Al-Si-N composite films were studied.The results show that Ti-Al-N composite film prepared by target of Ti0.33 Al0.67 exhibits dual-phase structure with fcc and hcp phases.The growth of hexagonal phase is promoted,the grains are refined and surface roughness is decreased for the films doped with Si.With increasing of Si content,the hardness of Ti-Al-Si-N composite films increases gradually to a maximum hardness of 32.3 GPa at Si content of 16.69 at% and then the hardness decreases.

关 键 词：Ti-Al-Si-N 磁控溅射 微结构 显微硬度 

分 类 号：TG174.44[金属学及工艺—金属表面处理] TG148[金属学及工艺—金属学]