18.2nm Schwarzschild显微物镜用多层膜带宽匹配问题分析  

The Analysis of Multilayer Waveband Matching for Schwarzschild Objective Working at 18.2nm

作　　者：王占山[1] 

机构地区：[1]中国科学院长春光学精密机械研究所应用光学国家重点实验室

出　　处：《光学精密工程》1999年第3期14-18,共5页Optics and Precision Engineering

基　　金：国家自然科学基金;吉林省科委青年基金

摘　　要：软Ｘ射线多层膜的进展使正入射高分辨率成像系统从红外、可见和紫外扩展到软Ｘ射线波段。由于软Ｘ射线多层膜的反射率还不能像其它波段反射镜反射率那样高，因此由两块同心球面反射镜组成的Ｓｃｈｗａｒｚｓｃｈｉｌｄ物镜在软Ｘ射线波段得到了广泛的应用。本文从多层膜带宽匹配条件、Ｓｃｈｗａｒｚｓｃｈｉｌｄ显微物镜的几何尺寸和多层膜镀制设备的性能出发，研究了实现Ｓｃｈｗａｒｚｓｃｈｉｌｄ显微物镜带宽匹配条件的镀膜过程，为实际制备Ｓｃｈｗａｒｚｓｃｈｉｌｄ显微物镜用多层膜提供理论指导。The developments of multilayers make normal incidence imaging systems with high resolution from wavelength range of infrared, visible and ultraviolet to soft X ray. The Schwarzschild objective which consists of two concentric mirrors is extensively used in soft X ray range because the reflectivity of multilayers is lower than that in other range. Combining the waveband matching condition with the configuration of Schwarzschild objective and performance of magnetron sputtering instrument, the multilayer coating process is analyzed for completing fabrication of multilayers using in 18.2nm Schwarzschild objective. The theoretic suggestion is supplied for making multilayers meeting with waveband matching condition.

关 键 词：软X射线多层膜 带宽匹配 显微物镜 

分 类 号：TH742[机械工程—光学工程] O434.1[机械工程—仪器科学与技术]