用溅射法合成Nd-Fe-B薄膜中的交换耦合作用的研究  

Studies on the Exchange Spring Effect of Sputtered Nd-Fe-B Thin Films

作　　者：赵强[1,2,3] 杨正[1,2,3] 松本光功 

机构地区：[1]中国科学院上海光学精密机械研究所 [2]兰州大学磁性材料研究所 [3]日本信州大学信息工学科

出　　处：《功能材料》1999年第3期249-251,共3页Journal of Functional Materials

摘　　要：采用ＤＣ对向靶溅射系统制备了Ｎｄ１４Ｆｅ８６－ｙＢｙ薄膜，随着ｙ值的增大，薄膜中产生了复杂的Ｎｄ－Ｆｅ－Ｂ相，随机分布的软磁相与硬磁相之间存在着ＥｘｃｈａｎｇｅＳｐｒｉｎｇＥｆｅｃｔ，并对此进行了分析和讨论，得出利用这种随机分布结构中的Ｅｘ－ｃｈａｎｇｅＳｐｒｉｎｇＥｆｅｃｔ是提高Ｎｄ－Ｆｅ－Ｂ薄膜最大磁能积的有效途径。Nd14Fe86- y B y thin films were deposited by DC facing target sputtering system,more and more complicated Nd-Fe-B phases were in films as y increased.The Exchange Spring Effect existed among the soft phases and hard phases in films,and was studied.It was drawn as a conclusion that the Exchange Spring Effect in random distributed structure was a efficient way to improve the (BH)max of Nd-Fe-B thin films.

关 键 词：薄膜 交换耦合作用 最大磁能积 永磁材料 合成 

分 类 号：TM273.051[一般工业技术—材料科学与工程]