磁控溅射C/W纳米多层膜的微观结构分析  

Microstructure of C/W multilayered films prepared by magnetron sputtering

作　　者：陈迪春[1] 蒋百灵[2] 时惠英[2] 付杨洪[2] 

机构地区：[1]西安理工大学现代分析测试中心,陕西西安710048 [2]西安理工大学材料科学与工程学院,陕西西安710048

出　　处：《电子显微学报》2010年第4期328-332,共5页Journal of Chinese Electron Microscopy Society

基　　金：国家重点基础研究发展计划(973计划)资助项目(2009CB724406)

摘　　要：利用非平衡磁控溅射离子镀技术以纯钨靶和纯石墨靶作为溅射源制备了C/W纳米多层膜。采用X射线衍射(XRD)、X射线光电子能谱(XPS)和高分辨透射电子显微镜(HRTEM)对薄膜相组成及其微观组织结构进行了分析。结果表明:W含量约为9 at.%的C/W薄膜具有周期厚度约为6.5 nm的多层结构;沉积的W元素不以单质态存在,而是与碳元素反应生成了WC纳米晶;薄膜中的碳为非晶态,碳主要以sp2键类石墨态存在。The C/W multilayered films have been prepared by unbalanced magnetron sputtering ion plating using graphite target and tungsten target as sputter source.The phase composition and microstructure were analyzed by XRD,XPS and TEM.The results showed that the C/W multilayered film with～9 at.% W have a average periodicity of～6.5 nm.Investigation of TEM and XPS showed that W element is not present as metal state but WC nano-crystalline formed by reacting with C element,the SAED image showed that carbon is amorphous,the XPS analysis showed that the bonding of carbon is mainly sp2 graphite.

关 键 词：磁控溅射 C/W多层膜 TEM XPS 

分 类 号：TB383[一般工业技术—材料科学与工程] TG174[金属学及工艺—金属表面处理]