全方位离子注入与沉积TiN薄膜的纳米压痕和纳米划擦行为  

Nanoindentation and Scratch Behavior of TiN Films Fabricated by Plasma Immersion Ion Implantation and Deposition

作　　者：刘洪喜[1] 蒋业华[1] 汤宝寅[2] 

机构地区：[1]昆明理工大学材料科学与工程学院,昆明650093 [2]哈尔滨工业大学现代焊接生产技术国家重点实验室,哈尔滨150001

出　　处：《真空科学与技术学报》2010年第5期545-550,共6页Chinese Journal of Vacuum Science and Technology

基　　金：国家自然科学基金(50671045)资助项目;云南省自然科学基金(2008ZC021M)资助项目;昆明理工大学分析测试基金(2009-022)资助项目

摘　　要：用等离子体浸没离子注入与沉积(PIIID)复合改性技术在AISI52100轴承钢基体表面合成了高硬耐磨的TiN薄膜。膜层的相组成及其表面形貌分别用X射线衍射(XRD)和原子力显微镜(AFM)表征。合成薄膜前后试样的力学性能经纳米压痕和划痕实验评价。XRD结果表明,膜层中主要存在TiN相,择优取向(200),同时含有少量TiO2和钛氮氧的化合物。AFM形貌显示出试样表面TiN呈定向排列,膜层均匀完整,结构致密。纳米压痕测试结果表明,膜层具有较高的纳米硬度和弹性模量,最大值分别达到22.5和330 GPa,较基体分别增长104.5%和50%。根据纳米划痕形貌和划痕深度随划痕位置的变化关系分析出,薄膜在纳米划擦过程中先后经历了弹性变形,弹塑性变形,加载开裂或卸载剥落三个阶段。划擦剥落抗力达到80mN,表明TiN薄膜具有很好的弹性恢复能力和较强的疲劳剥落抗力。The TiN films were fabricated by plasma immersion ion implantation and deposition （PIIID） on AISI52100 bearing steel substrates. The microstructures and mechanical properties of the TiN films were characterized with X-ray diffraction and atomic force microscopy and nano-indentation. The results show that the TiN films significantly improve the mechanical properties of the steel surface. For example, the highest nano-hardness and elastic modulus of the fairly smooth and compact TiN films are 22.5 GPa and 330 GPa, respectively, 104.5% and 50% higher than those of the substrates.The scratching proceeds from elastic deformation, to plastic deformation, and to load-induced cracking or delaminating due to unloading. The critical cracking resistance was found to be about 80 mN. Besides, the PIIID TiN film shows a fairly stronger elastic recovery and a higher fatigue delaminating resistance.

关 键 词：等离子体浸没离子注入与沉积 纳米压痕 纳米划擦行为 TIN薄膜 轴承钢 

分 类 号：TG172.44[金属学及工艺—金属表面处理]