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作 者:张彬[1] 毛陆虹[1] 谢生[1] 张世林[1] 郭维廉[1] 陈燕[1] 于欣[1]
出 处:《天津大学学报》2010年第7期649-654,共6页Journal of Tianjin University(Science and Technology)
基 金:国家自然科学基金重点资助项目(60536030;60736035)
摘 要:基于半导体环形激光器的电学双稳态行为的动力学模型,运用现代非线性动力学理论对其稳定性和分岔行为进行了分析和数值计算.结果表明,环形激光器中泵浦参数的变化可导致霍普夫分岔,产生极限环以至混沌等复杂的非线性运动.同时,计算了背散射参数变化对环形激光器工作分区的影响,计算表明在不同的工作区中环形激光器将呈现不同的非线性动力学行为包括分岔和混沌.从物理角度对引发这些复杂的非线性运动的原因进行了分析.结果和他人论文中的实验结果相一致.Based on dynamic model of the electrical bi-stable behavior of the semiconductor ring laser and the princi- ples of modem nonlinear dynamics, stability and bifurcation behavior of the semiconductor ring laser have been ana- lyzed and calculated. Results show that variation of pump parameters of the ring laser may lead to Hopf bifurcation and complicated nonlinear movements such as limit cycle and chaos. The effect of backscatter parameters on operation regions in the ring laser was calculated, results of which indicate that nonlinear dynamic behaviors of the ring laser including bifurcation and chaos vary with the operation region. Physical causes for these complicated nonlinear dynamic behaviors were analyzed, results of which are in agreement with those of the experiments in other research papers.
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