基于叉指结构的平面分形电容研究  

Fractal Planar Capacitors Based on Interdigital Structures

作　　者：徐文彬[1] 庄铭杰[1] 王德苗[2] 

机构地区：[1]集美大学信息工程学院,福建厦门361021 [2]浙江大学信息与电子工程系,浙江杭州310027

出　　处：《集美大学学报（自然科学版）》2010年第5期389-393,共5页Journal of Jimei University：Natural Science

基　　金：国家自然科学基金资助(50172042);福建省自然科学基金资助(2009JD1292);集美大学科研启动基金资助

摘　　要：以基于叉指结构的平面分形电容为研究对象,电容由激光刻蚀法制得,在测得其S参数后,利用ADS仿真工具进行了一阶等效电路参数提取及分析.结果表明,随着共面叉指电极间距的相对减小,电极间的耦合增大,相应的寄生电感也增大;而分形设计可以在保证电极间距不变的情况下,改善电容的工作稳定性.最后制得的分形平面电容的电容值在1~7 pF之间,电容稳定工作频率可达2.5 GHz以上,显示了较好的可调性和稳定性.This paper studied the fractal planar capacitors based on interdigital structures.The capacitors were made by laser techniques.After the S parameters measurement,ADS simulation was adopted to analyze the corresponding first-order equivalent circuit parameters.It was showed that with the relative decrease of the gap between coplanar electrodes,the coupling between electrodes was enhanced,and a larger parasitical inductance parameter was expected.On the other hand,fractal design was found beneficial for the improvement of the capacitors stability.The capacitance value of the final fractal structure planar capacitor was between 1~7 pF and its stable operating frequency could be lager than 2.5 GHz,suggesting its good adjustability and stability.

关 键 词：集成薄膜电容 叉指电极 分形 

分 类 号：TN603.5[电子电信—电路与系统]