碱溶性光敏丙烯酸树脂的合成及其在光成像体系中的应用  

Synthesis of alkali-soluble photosensitive acrylate resin and application in photoimageable system

作　　者：刘朋飞 陈宁 刘仁 张胜文 刘晓亚 

机构地区：[1]江南大学化学与材料工程学院,无锡214122

出　　处：《化工新型材料》2010年第9期81-84,共4页New Chemical Materials

基　　金：国家十一五科技支撑计划(2007BAE15B02)

摘　　要：首先用自由基溶液聚合法合成羟基丙烯酸酯共聚物PHMSB,通过PHMSB上羟基和偏苯三酸酐(TMA)的酯化反应生成碱溶性树脂PHMSB-T,再用PHMSB-T上羧基与甲基丙烯酸缩水甘油酯(GMA)反应,以三步法合成了碱溶性光敏丙烯酸树脂PHMSB-T-G。重点讨论了催化剂种类、催化剂用量、反应温度对第二步反应转化率的影响,用红外光谱(IR)、核磁共振氢谱(1H-NMR)、凝胶渗透色谱(GPC)、元素分析、差示扫描量热法(DSC)等对所得树脂进行结构表征,初步探索了PHMSB-T-G在光成像体系中的应用。结果表明:以PHMSB-T-G为基体树脂的光致抗蚀剂图像分辨率可以达到25μm。An alkali-soluble photosensitive acrylate resin PMHBS-T-G was obtained by the following three step.First,hydroxyl acrylate copolymer PHMSB was synthesized by free radical polymerization;Second,alkali-soluble resin PHMSB-T was prepared by the esterfication of TMA and OH groups of PHMSB;Third,PHMSB-T-G was synthesized by reaction of GMA and carboxyl group of PHMSB-T.The effects of catalyst types,catalyst amount and temperature on conversion of the second-step reaction were mainly discussed.The obtained resins were characterized by IR,1H-NMR,GPC,elemental analysis and DSC,and the property of PHMSB-T-G in photoimageable system was studied.It was shown that： the resolution of the photoresist reached the level of 25μm.

关 键 词：光敏丙烯酸树脂 碱溶性 光成像 光致抗蚀剂 

分 类 号：TQ325.7[化学工程—合成树脂塑料工业]