最优实验条件下碳纳米管膜的场发射特性  

Field emission properties of carbon nanotubes films in the optimal experimental conditions

作　　者：樊志琴[1] 蔡根旺[1] 李瑞[1] 黄浩[1] 张君德[1] 王建星[1] 康广生[1] 

机构地区：[1]河南工业大学理学院,河南郑州450001

出　　处：《功能材料》2010年第A02期229-231,共3页Journal of Functional Materials

基　　金：河南省教育厅自然科学基金资助项目(2008B140004)

摘　　要：利用微波等离子体化学气相沉积(MPCVD)方法,在不锈钢衬底上直接沉积碳纳米管膜。通过正交设计方法综合研究了反应温度、气压、沉积时间、甲烷流量对碳纳米管膜场发射性能的影响。结果表明,不同条件下制备的碳纳米管膜的场发射性能有很大差异,其中起主要作用的是反应温度和气压。保持氢气的流量(100mL/min)不变,温度为700～800℃时,反应室压强为6.5kPa时,场发射性能最好,开启场强仅为0.8V/μm,发射点分布密集、均匀。In this paper,we reported the CNTs films were directly synthesized on stainless steel substrates by MPCVD without pre-coating of catalyst layer,and especially investigated the influence of the reaction temperature,pressure,deposition time,and methane flow rate on field emission from such deposited carbon nanotubes films by the cross design method.The results showed that：under different prepared conditions,the field emission properties of carbon nanotubes films are very different,which play a major role is the reaction temperature and pressure.To maintain the flow of hydrogen（100mL/min） constant,temperature of 700-800℃,the reaction chamber pressure of 6.5kPa,the field emission properties of the is best,the turn-on field strength only is 0.8 V/μm,and emission sites are dense and uniform.

关 键 词：正交设计方法 碳纳米管 MPCVD 场发射 拉曼光谱 

分 类 号：O484.4[理学—固体物理]