This research explores Microwave Plasma Chemical Vapor Deposition (MPCVD) for depositing diamond films on steel alloys (316L, 4140, and 1018) with a vanadium carbide interlayer to enhance adhesion and compatibility. T...
supported by the Key Research and Development Program of Jilin Provincial Department of Science and Technology (No. 20210201031GX);Innovation capacity building project of Jilin Province (No. 2023C031-2);The Key Research and Development Program of Jiangsu Province (No. BE2022057-1)。
In this work, AlN films were grown using gallium (Ga) as surfactant on 4° off-axis 4H-SiC substrates via microwave plasma chemical vapor deposition (MPCVD). We have found that AlN growth rate can be greatly improved ...