非平衡磁控溅射双势阱静电波动及其共振耦合  

Electrostatic oscillation and coupling resonance in double trap of unbalanced magnetron sputtering

作　　者：牟宗信[1] 牟晓东[1] 贾莉[1] 王春[1] 董闯[1] 

机构地区：[1]大连理工大学物理与光电工程学院三束材料改性教育部重点实验室,大连116024

出　　处：《物理学报》2010年第10期7164-7169,共6页Acta Physica Sinica

基　　金：国家自然科学基金(批准号:50407015)资助的课题~~

摘　　要：非平衡磁控靶表面电场和磁场相互正交构成磁阱结构,磁控靶和与之平行的偏压基片之间形成了另一种势阱结构,等离子体静电波动在这两种势阱结构中形成耦合共振.采用Langmuir探针研究等离子体中参数和浮置电位信号的功率谱密度.典型放电条件下两种势阱结构中的本征频率分别约为30—50kHz和10—20kHz,两种势阱条件下根据声驻波共振模式计算的电子温度数值与实验结果相符合。The coupling resonance is induced by the plasma electrostatic oscillation in the magnetic trap consisting of the crossfield at the surface of the unbalanced magnetron sputtering target and the potential well composed of the magnetron sputtering target and the opposite bias substrate in parallel.Langmuir probe was used to study the plasma properties and power spectra density（PSD） of the floating potential signals.Under typical discharge conditions,the eigenfrequencies in both traps were respectively in the range of 30—50 kHz or 10—20 kHz,and the electron temperatures in both traps calculated with the acoustic standing wave mode conformed with the experimental results.

关 键 词：等离子体 磁控溅射 驻波 共振 

分 类 号：O534[理学—等离子体物理]