Texturization of mono-crystalline silicon solar cells in TMAH without the addition of surfactant  

作　　者：欧伟英 张瑶 李海玲 赵雷 周春兰 刁宏伟 刘敏 鲁伟明 张俊 王文静 

机构地区：[1]Laboratory of Solar Cell Technology,Institute of Electrical Engineering,Chinese Academy of Sciences [2]Department of Electronic Engineering,Guilin University of Electronic Technology

出　　处：《Journal of Semiconductors》2010年第10期130-134,共5页半导体学报（英文版）

基　　金：Project supported by the National High Technology Research and Development Program of China(No.2007AA05Z437)

摘　　要：Etching was performed on （100） silicon wafers using silicon-dissolved tetramethylammonium hydroxide （TMAH） solutions without the addition of surfactant. Experiments were carried out in different TMAH concentrations at different temperatures for different etching times. The surface phenomena, etching rates, surface morphology and surface reflectance were analyzed. Experimental results show that the resulting surface covered with uniform pyramids can be realized with a small change in etching rates during the etching process. The etching mechanism is explained based on the experimental results and the theoretical considerations. It is suggested that all the components in the TMAH solutions play important roles in the etching process. Moreover, TMA^＋ ions may increase the wettability of the textured surface. A good textured surface can be obtained in conditions where the absorption of OH-/H2O is in equilibrium with that of TMA＋/SiO2（OH）2^-.Etching was performed on （100） silicon wafers using silicon-dissolved tetramethylammonium hydroxide （TMAH） solutions without the addition of surfactant. Experiments were carried out in different TMAH concentrations at different temperatures for different etching times. The surface phenomena, etching rates, surface morphology and surface reflectance were analyzed. Experimental results show that the resulting surface covered with uniform pyramids can be realized with a small change in etching rates during the etching process. The etching mechanism is explained based on the experimental results and the theoretical considerations. It is suggested that all the components in the TMAH solutions play important roles in the etching process. Moreover, TMA^＋ ions may increase the wettability of the textured surface. A good textured surface can be obtained in conditions where the absorption of OH-/H2O is in equilibrium with that of TMA＋/SiO2（OH）2^-.

关 键 词：silicon solar cell TEXTURIZATION TMAH 

分 类 号：TM914.4[电气工程—电力电子与电力传动]