杂质对光学薄膜激光损伤阈值的影响  

Effect of Impurities on Laser Induced Damage to 1.06 μm Optical Coatings

作　　者：胡海洋[1] 范正修[1] 刘晔[1] 赵强[1] 范瑞瑛[1] 黄日成[1] 

机构地区：[1]中国科学院上海光机所

出　　处：《中国激光》1999年第6期489-492,共4页Chinese Journal of Lasers

摘　　要：通过对一系列１０６μｍＨｆＯ２／ＳｉＯ２全反膜样品进行的激光损伤阈值测试，以及二次离子质谱杂质含量测定的结果进行的比较分析，提出了减小膜系制备过程中杂质污染是提高光学薄膜激光损伤阈值行之有效的途径。将理论分析运用于具体生产实践中，获得了令人满意的结果。In this paper, the effect of impurities in the vacuum chamber during the deposition of optical coatings on laser induced damage threshold (LIDT) of films is analysed. The quantity of impurity is tested by second ion mass spectroscopy (SIMS). By comparing the testing result, it shows that getting rid of every kinds of factors which produce impurities in the thin films is a promising way to improve the LIDT of optical coatings.

关 键 词：杂质 激光损伤阈值 二次离子质谱 光学薄膜 

分 类 号：TN24[电子电信—物理电子学] O484.4[理学—固体物理]