原子力显微镜对TiN薄膜的分析研究  

Analysis of the Micro-structure of TiN Film with Atomic Force Microscopy(AFM)

作　　者：杨惠[1] 王振林[1] 唐丽文[1] 黄伟[2] 

机构地区：[1]重庆工学院材料科学与工程学院,重庆400050 [2]重庆工业职业技术学院,重庆400050

出　　处：《西南大学学报（自然科学版）》2010年第9期36-39,共4页Journal of Southwest University(Natural Science Edition)

基　　金：重庆市教育委员会资助项目(KJ060616);重庆市科技攻关重大项目(CSTC.2005AA3012-1)

摘　　要：主要论述了一种高精度的原子力显微镜AFM.IPC-208B型机在分子形态学方面的应用研究.以磁控溅射获得的TiN薄膜为例,从原子力显微镜测得的三维图上探析该TiN薄膜的优先生长面及其在优先生长面上的原子排布.实验不仅鉴定了测试材料的微观形态,也充分肯定了该原子力显微镜原子量级的精度及其在微观结构领域的潜在发展,为该机应用于微加工领域奠定了基础.This paper describes the study about the application of high-resolution atomic force microscopy （AFM.IPC-208B） in molecular morphology. With the TiN thin film prepared by magnetron sputtering method as an example,a three-dimension image is obtained by AFM.IPC-208B,and the preferential growing face and relevant atom arrangement of the TiN film are discussed. This experiment not only identifies the micro-structures of the materials,but also affirms the application potential of AFM.IPC-208B in micro-structure field and its precision of the atomic level.

关 键 词：原子力显微镜 TIN薄膜 微观结构 

分 类 号：O484.1[理学—固体物理]