模拟计算低能离子注入棉花种子的深度-浓度分布  

Monte Carlo Simulation of the Penetration Range Disteibution of Ion Beam With Low Energy Implanted in Plant Seeds

作　　者：井群[1,2] 刘效勇[1,2] 黄旭初[1,2] 

机构地区：[1]石河子大学师范学院物理系,新疆石河子832000 [2]石河子大学生态物理重点实验室,新疆石河子832000

出　　处：《科技信息》2010年第13X期11-13,共3页Science & Technology Information

基　　金：石河子大学科研专项项目资助(RCZX200694)

摘　　要：采用Monte Carlo方法模拟计算了Ti+、H+、N+、Ar+注入棉花种子的深度-浓度分布。采用经典的两体碰撞理论来近似离子与靶原子之间的作用,用严格的数值解法处理散射积分,得到了与实验值较为接近的结果。进一步分析了不同能量和离子源对注入深度-浓度的影响,为研究低能离子与植物种子之间的相互作用提供了理论依据。The penetration range distribution of ion beam with low energy is simulated with Monte Carlo method. The action of ions implanted in plant seeds is study by classical collision theory of two objects, and the diffusion integration is solved by rigorous numerical method. In this way, the penetration range distributions of different ions implanted in cotton seeds are calculated, and the effect of different energy are analyzed. The result indicated that the depth is agreement with experimental results, and the model is appropriate to describe this interaetion. This paper provides a computational method for the penetration range distribution of ions with low energy implanted in plant seeds.

关 键 词：离子注入 蒙特卡罗模拟 种子 深度-浓度分布 

分 类 号：S565.2[农业科学—作物学]