衬底和氧分压对Cu掺杂ZnO薄膜的结构及光学特性的影响  

Influence of substrate and oxygen partial pressures on structural and optical properties of Cu-doped ZnO films

作　　者：陶亚明[1] 马书懿[1] 陈海霞[1] 孟军霞[1] 侯丽莉[1] 贾迎飞[1] 尚小荣[1] 

机构地区：[1]西北师范大学物理与电子工程学院,甘肃兰州730070

出　　处：《功能材料》2010年第10期1716-1719,共4页Journal of Functional Materials

基　　金：国家自然科学基金资助项目(10874140);甘肃省自然科学基金资助项目(0710RJZA105)

摘　　要：采用射频磁控溅射方法在玻璃和硅(100)衬底上制备了不同氧分压的Cu掺杂ZnO(ZnO∶Cu)薄膜。利用X射线衍射(XRD)、原子力显微镜(AFM)和光致荧光发光(PL)等表征技术,研究了衬底和氧分压对ZnO∶Cu薄膜的结晶性能和光学特性的影响。结果显示薄膜沉积在Si衬底上比玻璃衬底上有更好c轴择优取向,两种衬底上沉积的薄膜有相同的氧分压结晶规律,且在氧氩比为10∶10时,薄膜c轴取向同时达到最好。通过对光致发光的研究表明,在低氧环境时玻璃衬底较容易制得好的发光薄膜,可在富氧环境时Si衬底上制得的薄膜发光性能较好。Cu-doped ZnO（ZnO∶Cu）films are prepared on glass and Si（100）substrates at different oxygen partial pressures by radio frequency reactive magnetron sputtering technique.The effect of various substrate and oxygen partial pressures on the crystalline and optical properties of ZnO∶Cu thin films were investigated by the X-ray diffraction（XRD）,atomic force microscopy（AFM）and fluorescence spectrophotometer.The results indicated that films deposited on Si substrates have a better c-axis preferred orientation than glass substrate.The films deposited on the various substrates have the same crystal law with increasing of oxygen partial pressure, and as the ratio of oxygen and argon is increased to 10∶10,the c-axis growth orientation of films achieve the best at the same time.Study on photoluminescence have shown that films prepared on the glass substrate have better light-emitting in poor oxygen environment,whereas films prepared on the Si substrate have better PL properties than on the glass substrate in rich oxygen environment.

关 键 词：ZnO∶Cu薄膜 磁控溅射 衬底 氧分压 光学特性 

分 类 号：O484.4[理学—固体物理] O484.5[理学—物理]