干涉空间相位光刻对准方法研究  

Research on the Method of Interferometric-Spatial-Phase for the Alignment of Lithography

作　　者：马平[1] 胡松[1] 周绍林[1] 徐文祥[1] 

机构地区：[1]中国科学院光电技术研究所,成都610209

出　　处：《微纳电子技术》2010年第10期634-637,642,共5页Micronanoelectronic Technology

基　　金：国家自然科学基金资助项目(60706005)

摘　　要：介绍了一种适合高分辨力接近/接触式光刻的新型纳米级光刻对准方法。简要阐述了该对准方法的基本原理,探讨了应用该对准方法的光学结构设计,提出了照明光路与干涉条纹捕获光路的垂直设计,采用单色非曝光光源远心照明方式并外加补偿光路的结构设计。在软件处理方面,提出采用九点四线曲面拟合面阵CCD细分方法及最小二乘曲线拟合定位方法,实现光刻对准精度的进一步提高。该光刻对准方法能够克服现有对准技术的诸多缺陷,具有纳米级对准精度,能够满足纳米光刻的对准需求。A new nanoscale alignment approach for the high resolution proximity-contact lithography is introduced.The basic principle of the method was introduced briefly,the design of optical structure was discussed,and the vertical design for the optical path of illuminance and capture for interference fringes were put forward.The monochrome unexposure source,the telecentric light mode and the structure design of the optical path compensator were adopted.In terms of the software disposal,it was proposed that the CCD subdivision by nine dots and four lines curve fitting area-scan and the localization by least squares curve simulation were adopted to improve the alignment accuracy of the lithography.The method can overcome many shortcomings of existing alignment methods with the nanoscale accuracy,and can satisfy the alignment need of the nanoscale lithography.

关 键 词：干涉空间相位对准 莫尔条纹 补偿光路 CCD细分 曲线拟合 

分 类 号：TN305.7[电子电信—物理电子学] O436.1[机械工程—光学工程]