纳米三坐标测量机的误差分析与分离  

Analysis and Separation of Nano-CMM Error

作　　者：杨洪涛[1] 费业泰[2] 陈晓怀[2] 夏瑞雪[2] 

机构地区：[1]安徽理工大学机械工程学院,安徽淮南232001 [2]合肥工业大学仪器科学与光电工程学院,安徽合肥230009

出　　处：《安徽理工大学学报（自然科学版）》2010年第3期36-40,共5页Journal of Anhui University of Science and Technology:Natural Science

基　　金：国家自然基金重大国际合作研究基金资助项目(50420120134)

摘　　要：针对所研制的纳米三坐标测量机的具体结构,运用现代精度保障理论和技术,结合动、静力学相关知识,进行了纳米量级水平的误差源全面分析,对各误差的表现形式和影响进行了详细的描述,为后续的误差分配和结构优化设计打下基础。根据纳米坐标测量机的精确环境要求和所研制的纳米三坐标测量机结构、误差分布特征和精度要求,利用微型三光束平面干涉仪,设计了相关的支架组成了误差分离实验装置,实现标准量示值误差、导轨直线度线值误差和俯仰、偏摆和滚转误差的一次性分离,减小激光干涉仪发热、振动等外界环境因素对测量机误差的影响,同时避免了使用单一功能的仪器分次非实时测量带来的附加误差。实际分离实验结果验证了误差分离实验装置的有效性与可靠性。According to the Nano-CMM structure,the nanometer level error source was analyzed by applying the modern accuracy theory and the dynamics and statics mechanics.The representation form and influence of various errors were described in detail,which was the basis of subsequent error distribution and structure optimization.Due to the requirements of the accurate circumstance,structure,error distribution character and precision requirement of the Nano-CMM,the error separating tool was constituted with the micro three light beam planar reflector laser interferometer and the correlative adjustable table,which realize the synchronous separation of the standard indicating error,the yaw,pitch and roll error of the guide strip and avoid the heat and vibration influence of interferometer to separation error.At the same time,the additive error created by the nonreal-time measurement of the single function instruments is avoided too.The validity and reliability of the facility is verified by the actual error separation result.

关 键 词：纳米三坐标测量机 误差源分析 三光束平面干涉仪 误差分离 

分 类 号：TH741[机械工程—光学工程]