磁控溅射法制备Mo/B_4C软X射线多层膜  

Studies of the Mo/B_4C Soft X-ray Multilayers Grown by Magnetron Sputtering

作　　者：吕俊霞[1] 马月英[1] 裴舒[1] 曹健林[1] 陈星旦[1] 

机构地区：[1]中国科学院长春光学精密机械研究所应用光学国家重点实验室,长春130022

出　　处：《真空科学与技术》1999年第2期143-145,共3页Vacuum Science and Technology

基　　金：国家自然科学基金重点项目;"86 3"高技术资助课题

摘　　要：用DC和RF磁控溅射法制备出了波长小于 10nm波段的Mo/B4 C软X射线多层膜反射镜。掠入射X射线衍射仪的测量结果表明 ,磁控溅射法有很高的控制精度 ,制备出的Mo/B4 C软X射线多层膜周期结构非常好 ,表 (界 )面粗糙度非常小 ,约为 0 4nm。Mo/B 4C soft X ray (with a wavelength less than 10 nm)multilayer mirrors were grown by DC and RF magnetron sputtering.The multilayers were studied with grazing incidence XRD.The results showed that the individual layer thickness and the periodicity of the films can be well controlled.Well defined interfaces can be obtained.The surface and interface roughness were estimated to be around 0.4 nm.

关 键 词：软X射线 多层膜 磁控溅射 Mo/B4C 

分 类 号：O484.8[理学—固体物理]