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作 者:袁佳晶[1] 卢文壮[1] 王红军[1] 徐锋[1] 左敦稳[1]
出 处:《人工晶体学报》2010年第5期1141-1145,共5页Journal of Synthetic Crystals
基 金:国家自然科学基金(No.50605032);江苏省自然科学基金(BK2008382)
摘 要:CVD金刚石膜是一种具有众多卓越特性的功能材料,在微机电系统(MEMS)领域有着广泛的应用前景。金刚石膜的精密微细图形化加工技术是将金刚石材料应用于MEMS微器件的关键技术。本文开展了金刚石微结构的制备实验研究,利用在硅微模具中沉积金刚石膜的方法成功制作了微细梁、微圆柱、十字结构、文字图形等一系列金刚石微结构。Raman、SEM、ADE等多种理化分析结果表明采用这种模型复制工艺能够获得表面质量好、图形复杂、形状和尺寸精度很高的金刚石微结构,并能够实现批量制造,是制作金刚石微器件的理想方法。CVD diamond film is an ideal functional material for Micro Electro-Mechanical Systems(MEMS) devices because of its excellent properties.Precise micro pattering of diamond film is the key technology for the application of diamond MEMS devices.The paper is focused on the fabrication technique of CVD diamond microstructure.Several diamond microstructures such as micro beams,micro cylinders,cross beams and characters were fabricated using CVD deposition based on silicon micro molds.The samples were tested by RAM,SEM and ADE.The results show that the mold copy technique is an ideal approach for the fabrication of diamond micro device,by which diamond microstructures can be prepared in batches with good surface quality,complex shape and precise dimension.
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