La_2Mo_3O_(12)薄膜的制备和光学性能研究  

Preparation and Optical Properties of La_2Mo_3O_(12) Thin Films

作　　者：姜雅丽[1] 晁明举[1] 袁斌[1] 程慧[1] 梁二军[1] 钱华丽[1] 

机构地区：[1]郑州大学物理工程学院材料物理教育部重点实验室,河南郑州450052

出　　处：《郑州大学学报（理学版）》2010年第4期56-60,共5页Journal of Zhengzhou University:Natural Science Edition

基　　金：河南省教育厅自然科学研究计划基金资助项目;编号2006140009

摘　　要：采用射频磁控溅射法制备La2Mo3O12薄膜并退火处理,用X射线衍射仪、扫描电镜、紫外-可见分光光度计、椭偏谱仪研究了薄膜的结晶特性、表面形貌和光学性能.结果表明,射频磁控溅射制备的La2Mo3O12薄膜为非晶态,退火后La2Mo3O12薄膜结晶主要为四面体结构和少量单斜结构,且薄膜表面平整,晶粒均匀.其光学带隙为3.63 eV,对近紫外光(200～280 nm)有良好的吸收性能,折射率在1.8到2.15之间,消光系数符合正常色散关系.La2Mo3O12 films are successfully prepared by radio frequency magnetron sputtering and annealing. The crystallization properties, surface morphology and optical properties of the La2Mo3O12 films are analyzed by X-ray diffractometer （XRD）, scanning electron microscope （SEM）, ultraviolet visible spectrometer（UV-Vis）and ellipsometric spectrometer. The results show that as-deposited La2Mo3O12 films are amorphous but annealed films crystallized mainly tet- rahedral structure and a small amount of monoclinic. The film has a good surface morphology and absorption properties for near-ultraviolet（200--280 nm）. Its optical bands gap width is 3.63 eV and refractive index is between 1.8 and 2. 15. The extinction coefficient varies consistent with normal dispersion relation.

关 键 词：La2Mo3O12薄膜 磁控溅射 光学性能 

分 类 号：O643[理学—物理化学]