基于NiosⅡ嵌入式处理器的UMS电源研究  

Research on an Unbalanced Magnetron Sputtering Power Supply Based on NiosⅡ

作　　者：郭庆吉[1] 陈少磊[1] 孙强[1] 

机构地区：[1]西安理工大学,自动化与信息工程学院,陕西西安710048

出　　处：《电力电子技术》2010年第11期93-95,共3页Power Electronics

基　　金：陕西省自然科学基金计划项目(2007E207);陕西省教育厅科研专项(08JK372);西安理工大学青年教师科学研究计划基金(105-210819)~~

摘　　要：研制了一台以NiosII嵌入式处理器为核心的非平衡磁控溅射(Unbalanced Magnetron Sputtering,简称UMS)高性能电源。采用片上可编程系统(System on a Programmable Chip,简称SOPC)的解决方案,结合嵌入式系统的优势,加入智能化复合控制策略和高频DPWM多自由度调制方法,以满足等离子体负载特性及工艺需求。测试结果表明,该电源具备高稳流、高离子束电流多自由度输出特性以及优异的电弧管理能力,为UMS先进工艺的探索提供了良好的技术平台。A high-performance unbalanced magnetron sputtering（UMS） power supply based on the NiosII embedded processor is developed.Combining the advantages of embedded system,the design adopts the methodology of SOPC.To meet the demands in plasma loading characteristics and techniques,intelligent hybrid control strategy and high frequency DPWM modulator with multiple degrees of freedom are proposed,and the experiment is implement.The experimental results show that the UMS power supply has high stable and precise current flow,high ion beam current output characteristics of multi-degree of freedom,and excellent capability in arc management,the design provides a good technical platform for the exploration and promotion of advanced technology of the UMS.

关 键 词：电源 处理器 电弧管理 非平衡磁控溅射 

分 类 号：TN86[电子电信—信息与通信工程]