沉积温度和碳纳米管对CVD SiC涂层微观形貌的影响  

Effects of deposition temperature and carbon nanotubes on microstructure of SiC coating by CVD

作　　者：张翔[1] 李军[1] 廖寄乔[1] 谭周建[1] 

机构地区：[1]中南大学粉末冶金国家重点实验室,长沙410083

出　　处：《粉末冶金材料科学与工程》2010年第5期511-515,共5页Materials Science and Engineering of Powder Metallurgy

基　　金：国家重点基础研究发展计划(973计划)资助项目(2006CB600904);国家自然科学基金委员会创新研究群体科学基金资助项目(50721003)

摘　　要：以三氯甲基硅烷（CH3SiCl3）为前驱体,采用化学气相沉积法（Chemical vapor deposition,CVD）,在原位生长有碳纳米管（Carbon nanotubes,CNTs）的C/C复合材料表面制备SiC涂层。用扫描电镜（SEM）和X射线能谱仪（EDS）观察和分析涂层微观形貌及成份。研究沉积温度（1 000~1 150℃）对SiC涂层的表面、截面以及SiC颗粒的微观形貌的影响。结果表明：在1 000℃下反应时,得到晶须状SiC;沉积温度为1 050℃时涂层平整、致密;沉积温度提高到1 100℃时,涂层粗糙,致密度下降;1 150℃下形成类似岛状组织,SiC颗粒团聚长大,涂层粗糙,并有很多裂纹和孔洞,致密度低。对涂层成份和断口形貌研究表明,基体和涂层之间有1个过渡区,SiC涂层和基体之间结合良好。SiC coating was deposited on C/C composites（pre-deposited with carbon nanotubes） by chemical vapor deposition（CVD） method using CH3SiCl3 as the precursor.Coating micro-morphologies and composition were investigated by SEM and EDS,respectively.Effects of deposit temperature in the range of 1 000~1 150 ℃ on the surface morphologies and microstructures in the cross section of SiC coatings were studied in detail.The results show that the whisker-like SiC coating can be obtained at 1 000 ℃,smooth and compact coating is obtained at 1 050 ℃,increasing temperature to 1 100 ℃,the coating becomes coarseness and density decrease,When deposit temperature is 1 150 ℃,SiC particles gathers and grows,the island-like structure and much cracks and pores appear on the coating surface.The studies of composition and fracture surface of the obtained coatings have shown that there is a transition zone between matrix and coating,which leads to a very high bonding strength between the SiC coating and the C/C matrix.

关 键 词：炭/炭复合材料 CNT-SiC复合涂层 碳纳米管 CVD 

分 类 号：TB332[一般工业技术—材料科学与工程]