一种设计真空紫外高反膜的新方法  

A new design method for high-reflection vacuum ultraviolet films

作　　者：刘兴悦[1] 戴佳鑫[1] 干蜀毅[1] 

机构地区：[1]合肥工业大学机械与汽车工程学院,安徽合肥230009

出　　处：《光学仪器》2010年第5期84-88,共5页Optical Instruments

摘　　要：在真空紫外强吸收波段采用"逐层"(LBL)设计法。通过阐述"逐层"设计的理论基础和膜材选择的基本原则,运用MatLab软件,用解析加复平面作图法设计了对应于50～200nm波段的高反膜系。以熔融石英基底上硅、碳组成的膜系为例,用这种设计方法获得的平均反射率最高可达64%。对比常规周期多层膜,这种设计法可以明显地提高强吸收波段的反射率。Layer-by-layer （LBL） design method is used in the vacuum ultraviolet （VUV） spectral region. The theoretical basis of LBL design method and the basic principle for the selection of a proper pair of materials are presented. The high reflective multilayers at wavelength between 50-200nm are designed with the aid of analysis method and graphic representation in Gaussian plane by use of software MatLab. The reflectance of designed multilayers with Si and C on a fused silica substrate can reach as high as 64%. Comparing with conventional quarter-wavelength design method, the reflectance can be significantly enhanced by using this method in given spectral region, especially when strong absorbing material is used.

关 键 词：真空紫外 高反膜 膜系设计 反射率 

分 类 号：TB43[一般工业技术]