微测辐射热计焦平面阵列非均匀性及片上校正电路的研究  

Non-uniformity of Microbolometer FPA and On-chip Correction Circuit

作　　者：冷余平[1] 吕坚[1] 周云[1] 王璐霞[1] 蒋亚东[1] 

机构地区：[1]电子科技大学电子薄膜与集成器件国家重点实验室,四川成都610054

出　　处：《红外》2010年第12期7-11,共5页Infrared

基　　金：国家自然科学基金项目(60736005)

摘　　要：非均匀性研究对于无温度稳定装置的微测辐射热计焦平面阵列极其重要。通过建立模型研究了各种因素对焦平面非均匀性的影响。在此基础上,提出了一种新的片上校正电路结构及其校正因子的计算方法,并采用为各像元提供不同暗电流的方法对输出非均匀性进行了校正。最后使用该结构模型进行了模拟仿真。结果显示,经过7位片上校正后,输出最大偏移从输出摆幅的49.7%降到了0.8%,输出均匀性得到了很大提高。Non-uniformity is extremely important to a microbolometer infrared focal plane array（FPA） without a temperature stabilizer.The influences of different factors on the non-uniformity of a FPA are studied by establishing a theoretical model.Then,a novel on-chip correction circuit and the method for calculating its correction factors are proposed.The non-uniformity in the output of the FPA is corrected by providing each pixel with different dark current.Finally,the on-chip correction is simulated.The result shows that after 7-bit correction,the peak-to-peak offset is reduced from 49.7%to 0.8%and the uniformity is improved greatly.

关 键 词：微测辐射热计 建模 非均匀性 片上校正 焦平面阵列 

分 类 号：TN215[电子电信—物理电子学]