超细晶粒钛表面掺钽TiO_2薄膜的微结构及血液相容性研究  

Research on microstructures and blood compatibility of Ta-doped TiO_2 films on ultrafine-grained Ti

作　　者：于春杭[1] 邵红红[1] 许晓静[1] 翟瑞[1] 

机构地区：[1]江苏大学材料科学与工程学院,江苏镇江212013

出　　处：《功能材料》2010年第A03期552-555,共4页Journal of Functional Materials

基　　金：国家自然科学基金资助项目(50772044);江苏省自然科学基金重点资助项目(BK2007707)

摘　　要：采用直流反应磁控溅射法在超细晶粒钛表面沉积掺钽TiO2薄膜,研究了不同掺Ta量对超细晶粒钛表面TiO2薄膜结构、形貌和血液相容性的影响规律。结果表明,超细晶粒钛具有强烈的诱导金红石相形核效应,室温下可以获得超过90%含量的金红石型TiO2;Ta的掺入具有细化薄膜晶粒并抑制金红石相形成的作用;掺入少量Ta的TiO2薄膜具有较优的血液相容性;掺入过量Ta的TiO2薄膜为无定形结构,因抑制金红石相形成反而恶化TiO2薄膜的血液相容性。The structure, morphology and blood compatibility of TiO2 films with different content Ta-doped that deposited on ultrafine-grained Ti by DC magnetron reactive sputtering technology were researched. The results show that ultrafine-grained Ti has s strong induction of rutile nucleation effect and TiO2 film deposited on ultrafine-grained Ti at room temperature contains above 90%（wt%） rutile phase. Ta-doped can refine the grain size of TiO2 film and inhibit the formation of rutile phase. TiO2 film with a few Ta-doped has optimal blood compatibility among other specimens with different content Ta-doped. And TiO2 film with excess Ta-doped is amorphous and deteriorates the blood compatibility of TiO2 film for inhibiting the formation of rutile phase.

关 键 词：掺钽TiO2薄膜 直流磁控溅射 超细晶粒钛 血液相容性 金红石 

分 类 号：TB43[一般工业技术] TG146.2[一般工业技术—材料科学与工程]