溅射制备的Al_2O_3薄膜的光学性质  

Optical Properties of Al_2O_3 Thin Films Made at Room Temperature by the Medium Frequency Reactive Magnetron Sputtering System

作　　者：骆红 廖国进[2] 

机构地区：[1]中石油东北炼化工程有限公司锦州设计院,辽宁锦州121001 [2]辽宁工业大学机械工程与自动化学院,辽宁锦州121001

出　　处：《沈阳农业大学学报》2010年第4期468-472,共5页Journal of Shenyang Agricultural University

基　　金：国家自然科学基金资助项目(50376067);辽宁省教育厅科学基金资助项目(2008316)

摘　　要：采用中频反应磁控溅射技术,在石英基片上制备了氧化铝薄膜。研究了氧化铝薄膜的XRD谱和Al 2p核心能级的XPS谱随不同制备氧分压比的演变规律。结果表明:随着制备氧分压比的增加,薄膜中的铝元素从金属态逐渐升高到正3价,同时薄膜由晶态逐渐转变成非晶态。当氧分压比为11%时,可以得到符合化学计量比的、非晶态的、表面非常光滑的氧化铝薄膜,该薄膜具有较高的折射率和较低的消光系数。AFM表面相貌图片显示:随氧分压比增加薄膜表面形貌呈现逐渐光滑的趋势。薄膜在300～1100nm波段有很高的透射率。以上性质表明用中频反应磁控溅射技术制备的氧化铝薄膜在光学领域有着广泛的应用前景。With MFRMS system,aluminium oxide thin films were deposited on glass substrates at room temperature under different oxygen pressure ratios（5%-11%）.The evolution of Al2p core level and oxygen concentration in the films was studied by XPS spectra.The relationship between the structure and oxygen partial pressure was studied with XRD spectra.The films that were stoichiometric were obtained when oxygen partial pressure was 11% with higher refractive index values and lower extinction coefficients.The analysis of AFM showed that the surface morphology changed more smooth with increase of oxygen partial pressure.The optical properties,such as film transmittance and optical constants of aluminium oxide thin films formed under different oxygen pressures were determined.Film properties demonstrated that the potential applications for aluminium oxide thin films in optical coatings and for MFRMS technology in deposition of metal oxide optical coatings.

关 键 词：中频反应磁控溅射 氧化铝薄膜 X射线光电子能谱(XPS) 光学特性 

分 类 号：TB43[一般工业技术]