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作 者:赵芳红[1] 吴云龙[1] 成惠峰[1] 谭欢[1]
出 处:《武汉理工大学学报》2010年第22期182-184,195,共4页Journal of Wuhan University of Technology
摘 要:采用射频磁控溅射和直流溅射方法在玻璃基片上低温制备ITO-Ag-ITO薄膜,测试了玻璃的透光度、方块电阻、电阻率,观察了因镀制Ag的膜层的时间的不同而引起的各项参数的变化规律,结果表明:随着Ag膜厚度的增加,试样的透过率急剧的下降;方块电阻开始降低的很快,但随着薄膜厚度的增加,电阻数值下降逐渐趋于缓慢;Ag膜的电阻率也随着厚度的增加而逐渐的降低。In this article ITO-Ag-ITO films are deposited on glass substrates by RF-magnetron sputtering and DC-magnetron sputtering.We examined the transparence、resistance of square and resistance,and observed the difference owing to the difference the Ag film's thickness.The results show that: as the increase of the thickness of the Ag film,the transparence of samples descended quickly and the resistance of square decreased quickly at first and then tent to slow down gradually,and the resistance of the Ag film also decreased slowly as the film thickness increases.
关 键 词:ITO-Ag-ITO-Glass Ag膜厚度 透过率 方块电阻 电阻率
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