温度对浮法在线APCVD法生产的TiO_2薄膜结构与性能的影响  

Influence of Temperature on Film Structure and Performance of TiO_2 Prepared with on-Line APCVD

作　　者：莫建良 

机构地区：[1]杭州蓝星新材料技术有限公司,杭州市310012

出　　处：《玻璃》2010年第12期3-5,共3页Glass

摘　　要：通过模拟浮法在线APCVD法生产TiO镀膜玻璃工艺,详细研究了玻璃基板温度对TiO薄膜膜层结构、形貌、光催化性能的影响。研究发现,基板温度影响TiO薄膜中各种晶相的相对比例,而不同晶相组成的膜层结构对膜层表面形貌和光催化性能有很大的影响。The influence of glass substrate temperature on film structure ,topography , photocatalysis of TiO2 was investigated by simulating on float line APCVD . It is concluded that the relative proportion of various crystalline phase in film was influenced by substrate temperature and the topography and photo-catalytic activity of TiO2 film were significantly affected by the crystalline phases.

关 键 词：APCVD TIO2薄膜 结构 形貌 光催化 

分 类 号：TQ171[化学工程—玻璃工业]