添加TiN对MoS_2基复合薄膜结构和性能的影响  

Effect of TiN Addition on the Microstructure and Performance of MoS_2-based Composite Films

作　　者：李倩倩[1,2] 尹桂林[2] 郑慈航[1] 余震[1] 何丹农[1,2] 

机构地区：[1]上海交通大学材料科学与工程学院,上海200240 [2]纳米技术及应用国家工程研究中心,上海200241

出　　处：《摩擦学学报》2011年第1期40-44,共5页Tribology

基　　金：国家自然科学基金项目(50675131)资助~~

摘　　要：通过磁控反应溅射方法制备MoSx-TiN复合薄膜,研究添加少量TiN对MoS2基薄膜结构和性能的影响.薄膜的结构和性能通过X射线光电子能谱仪(XPS)、X射线衍射仪(XRD)、场发射扫描电子显微镜(FESEM)及UMT-2多功能微摩擦磨损试验机等进行了表征.结果表明:与纯MoS2薄膜相比,少量TiN的添加使得MoSx-TiN复合薄膜(002)晶面择优取向且结构致密.与纯MoS2和MoS2-Ti薄膜相比,MoSx-TiN复合薄膜在潮湿大气条件下具有更优异的摩擦磨损性能,更低的摩擦系数.MoSx-TiN composite films were prepared by magnetron reaction-sputtering.The effect of small amount of TiN on the microstructure and performance of MoS2-based film was studied.The structure and properties of films were characterized by X-ray photoelectron spectroscopy（XPS）,X-ray diffraction（XRD）,field emission scanning electron microscopy（FESEM） and UMT-2 multi-functional tribometer.Experimental results indicated that,compared with pure MoS2 film,MoSx-TiN composite film had a stronger preferential orientation of crystal plane（002） and a compact microstructure.The MoSx-TiN composite film exhibited better tribological properties than that of pure MoS2 and MoS2-Ti films in humid air at room temperature.

关 键 词：MOS2 TIN 磁控反应溅射 摩擦磨损性能 

分 类 号：TQ174[化学工程—陶瓷工业] TH117.3[化学工程—硅酸盐工业]