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机构地区:[1]西安理工大学材料科学与工程学院,陕西西安710048
出 处:《材料热处理学报》2011年第1期92-96,共5页Transactions of Materials and Heat Treatment
基 金:国家高技术研究发展计划(863计划);闭合场非平衡磁控溅射离子镀镀膜装备研制和技术开发(2005AA33H010)
摘 要:采用Langmuir探针测定了不同磁场闭合状态下辉光放电环境中的电子温度(Te)、电子密度(ne)及离子密度(ni)空间分布状态,探讨了磁场闭合度对CrNx镀层沉积效率的影响机理。结果表明:三种磁场闭合状态下,电子温度都在靶面处最高,相邻靶间对称面最低,真空腔内部出现一个直径约240 mm的均匀中心区域;电子密度和离子密度在三种条件下均于真空腔中心处最高,边缘处最低,而随磁场闭合度的整体变化规律表现为这两个参数值在不闭合状态时小于半闭合和完全闭合状态时;完全闭合状态下镀层的厚度明显大于半闭合和不闭合状态下的镀层厚度。Langmuir probe was used to analyze the distribution feature of electron temperature(Te),electron density(ne) and ion density(ni) in the circumstance of electric discharge at different closed-state of magnetic field.The influence of closed-state of magnetic field on deposition efficiency of CrNx coatings was discussed.The results indicate that the highest Te occurs on the target surface but the lowest between the neighboring targets in the experimental conditions,and an uniform distribution area of electron temperature with diameter of 240 mm in the center of chamber appears,ne and ni both are highest in the center of chamber and lowest in the edge of it,and they are markedly smaller in the unclosed-state than in the semi-closed state and closed state.The thickness of CrNx coatings obtained in the closed state of magnetic field is obviously thicker than that in the unclosed state and semi-closed state.
关 键 词:磁场闭合状态 电子温度 电子密度 离子密度 CrNx镀层
分 类 号:TG174.44[金属学及工艺—金属表面处理]
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