HfO_2/SiO_2双色膜在1064nm和532nm激光辐照下的损伤特性  

Laser-induced damage of 1064nm antireflection/532nm high-reflection bichromatic coatings

作　　者：潘峰[1] 陈松林[1] 李海波[1] 马平[1] 王震[1] 

机构地区：[1]成都精密光学工程研究中心,成都610041

出　　处：《强激光与粒子束》2011年第1期75-78,共4页High Power Laser and Particle Beams

基　　金：国家高技术发展计划项目

摘　　要：采用电子束蒸发的方式,制备了有氧化硅内保护层和没有氧化硅内保护层的1 064 nm高透过、532 nm高反射的HfO2/SiO2双色膜,测量了它们的光学性能以及在基频和倍频激光辐照下的抗损伤性能。结果表明:氧化硅内保护层提高了双色膜在基频光辐照下的损伤阈值,对双色膜在倍频光辐照下的损伤阈值无明显影响。通过观察薄膜的损伤形貌,分析破斑的深度信息结合驻波场分布,对两类双色膜在基频光和倍频光下的损伤机制做了初步探讨。分析表明:氧化硅内保护层提高了膜基界面的抗损伤性能,从而提高了双色膜在基频光下的损伤阈值。1 064 nm antireflection/532 nm high-reflection bichromatic coatings with and without barrier layer were fabricated on the UBK7 substrate using electron beam evaporation technique.The optical property and laser-induced damage threshold（LIDT） of the coatings were investigated,respectively.Compared with the coatings without barrier layer,the 1 064 nm LIDT of the bichromatic coatings with SiO2 barrier layer is 49.6% higher.By analyzing the morphology and depth information of laser-induced damage spots,and the standing wave electric field distribution of the film stacks,the mechanisms of 1 064 nm and 532 nm laser-induced damages of the bichromatic coatings were discussed.The results show that SiO2 barrier layer strengthens the coatings-substrate interface,and therefore the 1 064 nm LIDT of the bichromatic coatings with barrier layer is improved.

关 键 词：双色膜 内保护层 基频光 倍频光 激光损伤 

分 类 号：O484[理学—固体物理]